THE THERMAL OXIDATION EFFECT OF THE SINGLE CRYSTAL SILICON (100) ON THE MAGNETIC PROPERTIES OF ULTRA-THIN FILMS OF COBALT.
- D?partement de Physique, Facult? des Sciences et Techniques, Universit? de Kara, B.P : 404, Kara, Togo.
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Abstract
We studied the systems Au/Co (t_Co= 0.7,0.8,and1 nm)/Au deposited on Si and SiO2 by polar magneto-optical Kerr effect magnetometry (PMOKE). Topologies of Si and SiO2 were studied by atomic force microscopy (AFM). We showed that the oxidation of Si induced a change in the evolution of the coercive field and that of the first order of the anisotropy constant according to the thickness of cobalt.
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How to Cite This Article
A. Adanlete Adjanoh (2018); THE THERMAL OXIDATION EFFECT OF THE SINGLE CRYSTAL SILICON (100) ON THE MAGNETIC PROPERTIES OF ULTRA-THIN FILMS OF COBALT., International Journal of Advanced Research (IJAR), 6 (08), 423-429, ISSN 2320-5407. DOI: https://doi.org/10.21474/IJAR01/7537
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