Investigation of Optical Properties of NiO0.99Cu0.01 Thin Film by Thermal Evaporation Technique

In this paper, NiO0.99Cu0.01 thin films were deposited by using thermal evaporation technique on Si substrates under vacuum 10-5 mbar. The structure and crystallite size of these films were established using atomic force microscope (AFM) and x-ray diffraction (XRD), it shows that the structure is polycrystalline and the average diameter is around 97.21nm. The optical properties; absorption, transmission, and reflection, as functions of wavelength were measured. Optical constants such as (refractive index n, dielectric constants ?i,r and extinction coefficient k) of the deposition films were obtained from the analysis of the experimental recorded transmittance spectral data. The optical band gap of NiO0.99Cu0.01 films are calculate from (?h?)1/2 vs. photon energy curve and from photoluminescence spectra.